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Effect of sputtering pressure on microstructure and bolometric properties of Nb: TiO2-x films for infrared image sensor applications Reddy, Y. Ashok Kumar; Shin, Young Bong; Kang, In-Ku; Lee, Hee Chul, JOURNAL OF APPLIED PHYSICS, v.119, no.4, 2016-01 |
Influence of Nb Doping Concentration on Bolometric Properties of RF Magnetron Sputtered Nb:TiO2-x Films Reddy, Y. Ashok Kumar; Shin, Young Bong; Kang, In-Ku; Lee, Hee Chul, JOURNAL OF ELECTRONIC MATERIALS, v.47, no.3, pp.2171 - 2176, 2018-03 |
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