DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, KC | ko |
dc.contributor.author | Lee, Seung Seob | ko |
dc.date.accessioned | 2007-11-06T08:48:07Z | - |
dc.date.available | 2007-11-06T08:48:07Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004 | - |
dc.identifier.citation | SENSORS AND ACTUATORS A-PHYSICAL, v.111, no.1, pp.37 - 43 | - |
dc.identifier.issn | 0924-4247 | - |
dc.identifier.uri | http://hdl.handle.net/10203/1838 | - |
dc.description.abstract | We present a novel 3D fabrication method utilizing a deep X-ray mask in which an electro-thermal micro xy-stage is integrated. The absorber of the X-ray mask is formed on the shuttle mass of the micro xy-stage and it is oscillated in x- and y-directions during exposures to modify the in-depth dose profile in the resist, usually PMMA. Curved or slanted microstructures are revealed by the modulated dose distribution and the development kinetics of the resist. The nuicro xy-stage is fabricated using a silicon-on-insulator (SOI) wafer, resulting in overhanging, 20 mum thick single-crystal silicon microstructures. It has 20 mum wide, 1 mm long bent-beam electro-thermal actuators along each axis and 10 mum wide, 1 mm long suspension beams supporting a 1.42 mm diameter shuttle mass. Displacements of the shuttle mass in x- and y-directions are both around 20 mum at 742 mW dc input power. Two-dimensional (2D) sinusoidal and tapered microstructures are fabricated through shuttle mass oscillation in two axes during exposures. (C) 2003 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | Elsevier Science Sa | - |
dc.subject | LITHOGRAPHY (MDXL)-D-2 | - |
dc.subject | MICROSTRUCTURES | - |
dc.title | Deep X-ray mask with integrated electro-thermal micro xy-stage for 3D fabrication | - |
dc.type | Article | - |
dc.identifier.wosid | 000189081800007 | - |
dc.identifier.scopusid | 2-s2.0-0442327435 | - |
dc.type.rims | ART | - |
dc.citation.volume | 111 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 37 | - |
dc.citation.endingpage | 43 | - |
dc.citation.publicationname | SENSORS AND ACTUATORS A-PHYSICAL | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Lee, Seung Seob | - |
dc.contributor.nonIdAuthor | Lee, KC | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | deep X-ray lithography | - |
dc.subject.keywordAuthor | X-ray mask | - |
dc.subject.keywordAuthor | integrated microactuator | - |
dc.subject.keywordAuthor | electro-thermal xy-stage | - |
dc.subject.keywordAuthor | LIGA | - |
dc.subject.keywordPlus | LITHOGRAPHY (MDXL)-D-2 | - |
dc.subject.keywordPlus | MICROSTRUCTURES | - |
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