Showing results 1 to 4 of 4
A chemical reaction path design for the atomic layer deposition of tantalum nitride thin films Kwon, Jung-Dae; Park, Jin-Seong; Lee, Han-Choon; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.9, no.9, pp.G282 - G284, 2006-06 |
(A) study on the plasma-enhanced atomic layer deposition of TaN thin films = Peald 법으로 증착된 TaN 박막 특성에 관한 연구link Chung, Hoi-Sung; 정회성; et al, 한국과학기술원, 2004 |
Comparison of Tantalum Nitride Films for Different NH3/H-2/Ar Reactant States in Two-Step Atomic Layer Deposition Kwon, Jung-Dae; Yun, Jungheum; Kang, Sang-Won, JAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.2, 2009 |
Large-Area Uniform 1-nm-Level Amorphous Carbon Layers from 3D Conformal Polymer Brushes. A "Next-Generation" Cu Diffusion Barrier? Kang, Yun-Ho; Lee, Sangbong; Choi, Youngwoo; Seong, Won Kyung; Han, Kyu Hyo; Kim, Jang Hwan; Kim, Hyun-Mi; et al, ADVANCED MATERIALS, v.34, no.15, 2022-04 |
Discover