Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Subject plasma

Showing results 1 to 9 of 9

1
Characteristics of plasma generated by polysilicon semiconductor bridge (SCB)

Lee, KN; Park, MI; Choi, SH; Park, Chong-Ook; Uhm, HS, SENSORS AND ACTUATORS A-PHYSICAL, v.96, no.2-3, pp.252 - 257, 2002-02

2
Characterization of $TiO_2$ thin films formed by plasma enhanced atomic layer deposition = PEALD법을 이용한 $TiO_2$ 박막 증착 및 특성에 관한 연구link

Park, Pan-Kwi; 박판귀; et al, 한국과학기술원, 2002

3
$H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구 = Investigation of the $H_2/Ar/TiCl_4$ and $N_2/H_2/Ar/TiCl_4$ inductively coupled plasma enhanced CVD system for the deposition of Ti and TiN filmslink

장성수; Jang, Seong-Soo; et al, 한국과학기술원, 2001

4
Reactive ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma

Lee, SK; Chun , Soung Soon; Hwang, CY; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.50 - 55, 1997-01

5
Reactive ion etching mechanism of RuO2 thin films in oxygen plasma with the addition of CF4, Cl-2, and N-2

Lee, EJ; Kim, JW; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.5A, pp.2634 - 2641, 1998-05

6
RF magnetron sputtering 증착공정에서 플라즈마 특성과 비정질 $CN_x$ 박막성질의 상관관계에 관한 연구 = A study on the correlation between the plasma and amorphous $CN_x$ film characteristics using RF magnetron sputteringlink

노기민; Roh, Ki-Min; et al, 한국과학기술원, 2011

7
Transformer coupled plasma enhanced metal organic chemical vapor deposition of Ta(Si)N thin films and their Cu diffusion barrier properties

Park, HL; Byun, KM; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.41, no.10, pp.6153 - 6164, 2002-10

8
반도체 브리지의 특성에 관한 연구 = A study on the characteristics of semiconductor bridge (SCB)link

박명일; Park, Myung-Il; et al, 한국과학기술원, 2001

9
플라즈마 에칭과 플라즈마 밀도 분포가 탄소나노튜브의 전계 방출 특성에 미치는 영향에 대한 연구 = Plasma etching and plasma density distribution effects on electric field emission properties of carbon nanotubeslink

강경태; Kang, Kyong-Tae; et al, 한국과학기술원, 2002

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