DSpace at KOASAS: $H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구

DSpace at KOASAS

College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Theses_Ph.D.(박사논문)

$H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구Investigation of the $H_2/Ar/TiCl_4$ and $N_2/H_2/Ar/TiCl_4$ inductively coupled plasma enhanced CVD system for the deposition of Ti and TiN films

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장성수 / Jang, Seong-Soo

Advisors: 이원종 researcher; Lee, Won-Jong researcher

Description: 한국과학기술원 : 재료공학과,

Publisher: 한국과학기술원

Issue Date: 2001

Identifier: 165737/325007 / 000955326

Language: kor

Description: 학위논문(박사) - 한국과학기술원 : 재료공학과, 2001.2, [ ix, 127 p. ]

Keywords: 기상화학증착; 타이타늄 나이트라이드; 타이타늄; 유도결합플라즈마; 플라즈마; plasma; CVD; TiN; Ti; inductively coupled plasma

URI: http://hdl.handle.net/10203/50410

Link: http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165737&flag=dissertation

Appears in Collection: MS-Theses_Ph.D.(박사논문)

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$H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구Investigation of the $H_2/Ar/TiCl_4$ and $N_2/H_2/Ar/TiCl_4$ inductively coupled plasma enhanced CVD system for the deposition of Ti and TiN films

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