Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force

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dc.contributor.authorPark, Jun Huiko
dc.contributor.authorHwang, Seongpilko
dc.contributor.authorKim, Byung-Kwonko
dc.contributor.authorKwak, Juhyounko
dc.date.accessioned2013-06-07T09:11:03Z-
dc.date.available2013-06-07T09:11:03Z-
dc.date.created2013-05-24-
dc.date.created2013-05-24-
dc.date.issued2013-05-
dc.identifier.citationELECTROCHEMISTRY COMMUNICATIONS, v.30, pp.99 - 102-
dc.identifier.issn1388-2481-
dc.identifier.urihttp://hdl.handle.net/10203/173902-
dc.description.abstractHerein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry. (C) 2013 Elsevier B.V. All rights reserved,-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE INC-
dc.subjectEDGE-SPREADING LITHOGRAPHY-
dc.subjectSELF-ASSEMBLED MONOLAYERS-
dc.subjectDIP-PEN NANOLITHOGRAPHY-
dc.subjectGOLD-
dc.subjectARRAYS-
dc.subjectSILVER-
dc.subjectNANOPARTICLE-
dc.subjectCRYSTALS-
dc.titleSoft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force-
dc.typeArticle-
dc.identifier.wosid000317453100025-
dc.identifier.scopusid2-s2.0-84874939889-
dc.type.rimsART-
dc.citation.volume30-
dc.citation.beginningpage99-
dc.citation.endingpage102-
dc.citation.publicationnameELECTROCHEMISTRY COMMUNICATIONS-
dc.identifier.doi10.1016/j.elecom.2013.02.011-
dc.contributor.localauthorKwak, Juhyoun-
dc.contributor.nonIdAuthorPark, Jun Hui-
dc.contributor.nonIdAuthorHwang, Seongpil-
dc.contributor.nonIdAuthorKim, Byung-Kwon-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorColloidal lithography-
dc.subject.keywordAuthorSelf-assembled monolayer-
dc.subject.keywordAuthorMagnetic microsphere-
dc.subject.keywordAuthorSwelling-
dc.subject.keywordAuthorMicroelectrodes array-
dc.subject.keywordPlusEDGE-SPREADING LITHOGRAPHY-
dc.subject.keywordPlusSELF-ASSEMBLED MONOLAYERS-
dc.subject.keywordPlusDIP-PEN NANOLITHOGRAPHY-
dc.subject.keywordPlusGOLD-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusSILVER-
dc.subject.keywordPlusNANOPARTICLE-
dc.subject.keywordPlusCRYSTALS-
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