CHEMICAL-VAPOR-DEPOSITION; POLYHEDRAL OLIGOMERIC SILSESQUIOXANE; FLUORINATED ALKYL SILANE; COTTON TEXTILES; THIN-FILMS; SILICA NANOPARTICLES; STRUCTURED SURFACES; LENGTH SCALES; WETTABILITY; POLY(3,4-ETHYLENEDIOXYTHIOPHENE)
POLYMER CHEMISTRY, v.4, no.5, pp.1664 - 1671
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