플라즈마화학증착법으로 제조된 PbTiO3 와 PbZrO3 적층박막구조에서의 PZT 형성

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From the amorphous multilayer structure composed of PbTiO3 and PbZrO3 thin films by plasma enhanced metalorganic chemical vapor deposition method, the preparation of single phase PZT thin films has been performed by the interdiffusion reaction through an appropriate thermal annealing process. The transformation to a single-phase PZT from the multilayer was initiated at around 450 ℃ and almost completed at 550 ℃ under the fixed time of 1 hr. The electrical properties of the single-phase PZT thin film (Zr/Ti = 54/46, 180 nm) on Pt coated substrate were evaluated.
Publisher
한국화학공학회
Issue Date
2003-04-01
Language
KOR
Citation

한국화학공학회 춘계학술발표회, pp.0 - 0

URI
http://hdl.handle.net/10203/152557
Appears in Collection
CBE-Conference Papers(학술회의논문)
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