Hafnium-oxide-based high-K metal-insulator-metal capacitors (MIMCAPs) for RF/analog CMOS technologies Hafnium-oxide-based high-K metal-insulator-metal capacitors (MIMCAPs) for RF/analog CMOS technologies

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Issue Date
2004-11-15
Language
ENG
Citation

2004 Asia-Pacific Microwave Conference, pp.0 - 0

URI
http://hdl.handle.net/10203/139599
Appears in Collection
EE-Conference Papers(학술회의논문)
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