Hafnium-oxide-based high-K metal-insulator-metal capacitors (MIMCAPs) for RF/analog CMOS technologies Hafnium-oxide-based high-K metal-insulator-metal capacitors (MIMCAPs) for RF/analog CMOS technologies

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dc.contributor.authorCho, Byung Jin-
dc.contributor.authorKim, SJ-
dc.contributor.authorLi, MF-
dc.contributor.authorYu, MB-
dc.date.accessioned2013-03-17T03:57:57Z-
dc.date.available2013-03-17T03:57:57Z-
dc.date.created2012-02-06-
dc.date.issued2004-11-15-
dc.identifier.citation2004 Asia-Pacific Microwave Conference, v., no., pp.0 - 0-
dc.identifier.urihttp://hdl.handle.net/10203/139599-
dc.languageENG-
dc.titleHafnium-oxide-based high-K metal-insulator-metal capacitors (MIMCAPs) for RF/analog CMOS technologies-
dc.title.alternativeHafnium-oxide-based high-K metal-insulator-metal capacitors (MIMCAPs) for RF/analog CMOS technologies-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage0-
dc.citation.endingpage0-
dc.citation.publicationname2004 Asia-Pacific Microwave Conference-
dc.identifier.conferencecountryIndia-
dc.identifier.conferencecountryIndia-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorKim, SJ-
dc.contributor.nonIdAuthorLi, MF-
dc.contributor.nonIdAuthorYu, MB-
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EE-Conference Papers(학술회의논문)
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