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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

Water-developable resists based on glyceryl methacrylate for 193-nm lithography

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Kim, Jin-Baekresearcher / Jang, Ji-Hyun / Choi, Jae-Hak / Lee, Kwan-Ku / Ko, Jong-Sung
Issue Date
2004-02-23
Language
ENG
Citation

Advances in Resist Technology and Processing XXI, v.5376, pp.616 - 624

URI
http://hdl.handle.net/10203/138809
Appears in Collection
CH-Conference Papers(학술회의논문)
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