Ultra thin copper film deposition by metal-organic chemical vapor deposition on ruthenium thin film

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Issue Date
2005-10-16
Language
ENG
Citation

208th Meeting of The Electrochemical Society, pp.1179 -

ISSN
1091-8213
URI
http://hdl.handle.net/10203/138780
Appears in Collection
MS-Conference Papers(학술회의논문)
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