Ultra thin copper film deposition by metal-organic chemical vapor deposition on ruthenium thin film

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dc.contributor.authorKwak D.-K.-
dc.contributor.authorLee H.-B.-
dc.contributor.authorKang S.-W.-
dc.date.accessioned2013-03-17T02:17:12Z-
dc.date.available2013-03-17T02:17:12Z-
dc.date.created2012-02-06-
dc.date.issued2005-10-16-
dc.identifier.citation208th Meeting of The Electrochemical Society, v., no., pp.1179 --
dc.identifier.issn1091-8213-
dc.identifier.urihttp://hdl.handle.net/10203/138780-
dc.languageENG-
dc.titleUltra thin copper film deposition by metal-organic chemical vapor deposition on ruthenium thin film-
dc.typeConference-
dc.identifier.scopusid2-s2.0-33645711678-
dc.type.rimsCONF-
dc.citation.beginningpage1179-
dc.citation.publicationname208th Meeting of The Electrochemical Society-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorKang S.-W.-
dc.contributor.nonIdAuthorKwak D.-K.-
dc.contributor.nonIdAuthorLee H.-B.-
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MS-Conference Papers(학술회의논문)
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