Patterned polymer growth on silicon surfaces using microcontact printing and surface-initiated polymerization

Patterned polymer films were grown on SiO2/Si surfaces by a process starting with microcontact printing (mu CP) of octadecyltrichlorosilane (OTS), formation of a monolayer derived from norbornenyl trichlorosilane (Nbn-SiCl3) in areas not protected by OTS, activation of the surfaces derived from Nbn-SiCl3 with a ruthenium catalyst, and surface-initiated ring-opening metathesis polymerization of derivatives of norbornene by the catalytically active ruthenium species. These patterned polymer films were successfully used as reactive ion etching resists. The combination of mu CP and surface-initiated polymerization makes possible molecular-level control of polymer composition and thickness in both lateral and vertical directions: the smallest patterned lateral features were 2 mu m lines; this width was determined by the features of the stamp used in mu CP and is not the intrinsic limit of the method. The thickness of the polymer film was, typically, 5-100 nm and could be controlled by monomer concentration and reaction time. (C) 1999 American Institute of Physics. [S0003-6951(99)01052-9].
Publisher
AMER INST PHYSICS
Issue Date
1999-12
Language
ENG
Keywords

METATHESIS POLYMERIZATION; GOLD; ALKANETHIOLS; FILMS

Citation

APPLIED PHYSICS LETTERS, v.75, no.26, pp.4201 - 4203

ISSN
0003-6951
DOI
10.1063/1.125582
URI
http://hdl.handle.net/10203/12927
Appears in Collection
CH-Journal Papers(저널논문)
Files in This Item
9.pdf(386.98 kB)Download
  • Hit : 33
  • Download : 102
  • Cited 0 times in thomson ci
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡClick to seewebofscience_button
⊙ Cited 138 items in WoSClick to see citing articles inrecords_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0