Nanoscopic Pd line arrays using nanocontact printed dendrimers

High-density Pd line arrays with 55 nm line-width were obtained using nanocontact-printed dendrimer monolayers. Elastomeric PDMS stamps for nanocontact printing were replicated from silicon master molds which were fabricated by UV nanoimprinting in combination with reactive ion etching. The fabrication method effectively controlled the aspect ratios of high-density lines for resolving the problems encountered in both replicating silicon masters to PDMS stamps and printing with the replicated PDMS stamps. Using the PDMS nanostamp with an optimized aspect ratio, a self-assembled monolayer of dendrimer was patterned on a Pd film via nanocontact printing, which was facilitated by the strong interaction between Pd and amine groups of the dendrimer. The patterned self-assembled monolayer was used as an etch-resist mask against the wet etchant of Pd, leaving behind a high-density Pd line array over large areas. The resulting functional Pd nanopattem is of practical significance in microelectronics and bio- or gas-sensing devices.
Publisher
AMER CHEMICAL SOC
Issue Date
2006-03
Language
ENG
Keywords

SELF-ASSEMBLED MONOLAYERS; DIP-PEN NANOLITHOGRAPHY; STAMP DEFORMATION; SOFT LITHOGRAPHY; PATTERN TRANSFER; ETCH RESISTS; FABRICATION; MICROSTRUCTURES; PALLADIUM; MULTILAYERS

Citation

LANGMUIR, v.22, no.7, pp.3326 - 3331

ISSN
0743-7463
DOI
10.1021/la0525170
URI
http://hdl.handle.net/10203/12861
Appears in Collection
CBE-Journal Papers(저널논문)
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