Multiscale nanopatterns templated from two-dimensional assemblies of photoresist particles

Multiscale nanopatterns fabricated by colloidal lithography, using two-dimensional self-assemblies of photoresist particles as masks, are presented. The colloidal masks with features of multiple length scales are obtained by photolithography and used for constructing submicrometer-hole arrays over large areas (see Figure). By depositing functional materials through these masks, nanopatterned substrates useful in a wide range of applications can be produced.
Publisher
WILEY-V C H VERLAG GMBH
Issue Date
2005-11
Language
ENG
Keywords

NANOSPHERE LITHOGRAPHY; COLLOIDAL CRYSTALS; ARRAYS; SURFACE; POLYSTYRENE; SIZE; NANOPARTICLES; FABRICATION; INTEGRATION; SCALE

Citation

ADVANCED MATERIALS, v.17, pp.2559 - +

ISSN
0935-9648
DOI
10.1002/adma.200501167
URI
http://hdl.handle.net/10203/12621
Appears in Collection
CBE-Journal Papers(저널논문)
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