Colloidal lithographic nanopatterning via reactive ion etching

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dc.contributor.authorChoi, DGko
dc.contributor.authorYu, HKko
dc.contributor.authorJang, SGko
dc.contributor.authorYang, Seung-Manko
dc.date.accessioned2009-11-16T02:22:52Z-
dc.date.available2009-11-16T02:22:52Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2004-06-
dc.identifier.citationJOURNAL OF THE AMERICAN CHEMICAL SOCIETY, v.126, no.22, pp.7019 - 7025-
dc.identifier.issn0002-7863-
dc.identifier.urihttp://hdl.handle.net/10203/12616-
dc.description.abstractWe report here a novel colloidal lithographic approach to the fabrication of nonspherical colloidal particle arrays with a long-range order by selective reactive ion etching (RIE) of multilayered spherical colloidal particles. First, layered colloidal crystals with different crystal structures (or orientations) were self-organized onto substrates. Then, during the RIE, the upper layer in the colloidal multilayer acted as a mask for the lower layer and the resulting anisotropic etching created nonspherical particle arrays and new patterns. The new patterns have shapes that are different from the original as a result of the relative shadowing of the RIE process by the top layer and the lower layers. The shape and size of the particles and patterns were dependent on the crystal orientation relative to the etchant flow, the number of colloidal layers, and the RIE conditions. The various colloidal patterns can be used as masks for two-dimensional (2-D) nanopatterns. In addition, the resulting nonspherical particles can be used as novel building blocks for colloidal photonic crystals.-
dc.description.sponsorshipThis work was supported by the Center for Nanoscale Mechatronics and Manufacturing of the 21st Century Frontier Research Program (M102KN010001-02K1401- 00212) and the National R&D Project for Nano Science and Technology. The authors also acknowledge partial supports from the Brain Korea 21 program, CUPS-ERC and the IMT-2000 Projects.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherAMER CHEMICAL SOC-
dc.subject3-DIMENSIONAL PHOTONIC CRYSTALS-
dc.subjectPERIODIC NANOPILLAR ARRAYS-
dc.subjectNANOSPHERE LITHOGRAPHY-
dc.subjectNANOIMPRINT LITHOGRAPHY-
dc.subjectSPHERICAL COLLOIDS-
dc.subjectFABRICATION-
dc.subjectSURFACES-
dc.subjectPLASMA-
dc.subjectSIZE-
dc.subjectCRYSTALLIZATION-
dc.titleColloidal lithographic nanopatterning via reactive ion etching-
dc.typeArticle-
dc.identifier.wosid000221828200041-
dc.identifier.scopusid2-s2.0-3042733427-
dc.type.rimsART-
dc.citation.volume126-
dc.citation.issue22-
dc.citation.beginningpage7019-
dc.citation.endingpage7025-
dc.citation.publicationnameJOURNAL OF THE AMERICAN CHEMICAL SOCIETY-
dc.identifier.doi10.1021/ja0319083-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorYang, Seung-Man-
dc.contributor.nonIdAuthorChoi, DG-
dc.contributor.nonIdAuthorYu, HK-
dc.contributor.nonIdAuthorJang, SG-
dc.type.journalArticleArticle-
dc.subject.keywordPlus3-DIMENSIONAL PHOTONIC CRYSTALS-
dc.subject.keywordPlusPERIODIC NANOPILLAR ARRAYS-
dc.subject.keywordPlusNANOSPHERE LITHOGRAPHY-
dc.subject.keywordPlusNANOIMPRINT LITHOGRAPHY-
dc.subject.keywordPlusSPHERICAL COLLOIDS-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusSURFACES-
dc.subject.keywordPlusPLASMA-
dc.subject.keywordPlusSIZE-
dc.subject.keywordPlusCRYSTALLIZATION-
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