Investigation of three-dimensional pattern collapse owing to surface tension using an imperfection finite element model

Precise fabrication of three-dimensional (3D) microstructures having nano-details has become realized using two-photon induced photopolymerization (TPP) since several years ago; and now, this technology is recognized as a promising process for the creation of 3D neo-conceptive nano- and microscale devices. However, there are still important issues to be settled for the practical use of TPP. One of them is the 3D pattern collapse due to the surface tension of rinse materials in a development process, which impedes the progress of 3D precise microfabrication via TPP. To solve this issue effectively, finite element analyses of 3D pattern collapse using an imperfection model were conducted. Overall of this work, we showed the mechanism of 3D pattern collapse and the way how to reduce pattern deformation effectively during a developing process using experimental and analytical approaches. (c) 2007 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2008-02
Language
ENG
Keywords

2-PHOTON POLYMERIZATION; RESIST; MICROMACHINES; RESOLUTION; LIGHT

Citation

MICROELECTRONIC ENGINEERING, v.85, no.2, pp.432 - 439

ISSN
0167-9317
DOI
10.1016/j.mee.2007.08.003
URI
http://hdl.handle.net/10203/12219
Appears in Collection
ME-Journal Papers(저널논문)
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