VAPOR-DEPOSITION PRECURSORS; THIN-FILM GROWTH; ADSORPTION/DESORPTION BEHAVIOR; COPPER; SURFACES; SILICA; FTIR; CVD; (1,1,1,5,5,5-HEXAFLUOROACETYLACETONATO)(VINYLTRIMETHYLSILANE)COPPER(I); (HFAC)CU(VTMS)
SURFACE SCIENCE, v.482, pp.312 - 317
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