Nanogap Electrode Fabrication for a Nanoscale Device by Volume-Expanding Electrochemical Synthesis

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A novel nanogap fabrication method using an electrochemical nanopatterning technique is presented. Electrochemical deposition of platinum ions reduces the microgap size to the sub-50-nm range due to the self-limited volume expansion of the electrodes. Additionally, the low crystallinity of platinum reduces the line edge roughness in the electrodes, whereas the high crystallinity of gold increases it. Current compliance, a buffered resistor, and a symmetric deposition strategy are used to achieve high reliability and practicality of nanogap electrodes. As a possible application, an organic thin-film transistor using the nanogap electrodes is also demonstrated.
Publisher
WILEY-BLACKWELL
Issue Date
2011-08
Language
English
Article Type
Article
Keywords

FIELD-EFFECT TRANSISTORS; DIP-PEN NANOLITHOGRAPHY; METALLIC ELECTRODES; MOLECULAR RULERS; COULOMB-BLOCKADE; SEPARATION; ELECTROMIGRATION; NANOSTRUCTURES; LITHOGRAPHY; CONTACTS

Citation

SMALL, v.7, no.15, pp.2210 - 2216

ISSN
1613-6810
DOI
10.1002/smll.201002103
URI
http://hdl.handle.net/10203/103622
Appears in Collection
EE-Journal Papers(저널논문)
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