DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Jisun | ko |
dc.contributor.author | Lee, Su Kyoung | ko |
dc.contributor.author | Jung, Jin-Mi | ko |
dc.contributor.author | Baek, Youn Kyoung | ko |
dc.contributor.author | Jung, Hee-Tae | ko |
dc.date.accessioned | 2013-03-12T12:33:15Z | - |
dc.date.available | 2013-03-12T12:33:15Z | - |
dc.date.created | 2012-07-04 | - |
dc.date.created | 2012-07-04 | - |
dc.date.created | 2012-07-04 | - |
dc.date.issued | 2012-01 | - |
dc.identifier.citation | RSC ADVANCES, v.2, no.5, pp.2043 - 2046 | - |
dc.identifier.issn | 2046-2069 | - |
dc.identifier.uri | http://hdl.handle.net/10203/102337 | - |
dc.description.abstract | We report on the fabrication of well-aligned multi-segment line patterns over large areas featuring dimensional and compositional exquisite tunability using a combination of photolithography and soft-lithography techniques. We show that thus this new top-down approach has great advantages and that it is beneficial by increasing the control of the multi-segment line width and pattern feature dimensions ranging from microns to a few hundred nanometres. Various combinations of multisegment materials with full control over the periodic alignment, which include Au-Ni, Au-Cu and Au-Ag, were prepared by simply changing the metals evaporated before the lift-off process. Au-Ni multi-segment metal line patterns showed a linear current-voltage response, identical with that of a line pattern from a single material. Thus, one can take advantage of the simple electrical properties of the 1-dimensional nanostructure. Our approach provides great potential in practical fabrication of well-integrated multi-metal component devices for electrical and optical detection. | - |
dc.language | English | - |
dc.publisher | ROYAL SOC CHEMISTRY | - |
dc.subject | CAPILLARY FORCE LITHOGRAPHY | - |
dc.subject | NANOWIRES | - |
dc.subject | NANOPARTICLES | - |
dc.subject | TRANSISTORS | - |
dc.subject | PREPATTERN | - |
dc.title | Fabrication of highly ordered multi-segment line pattern over a large-area | - |
dc.type | Article | - |
dc.identifier.wosid | 000300317700046 | - |
dc.identifier.scopusid | 2-s2.0-84859198448 | - |
dc.type.rims | ART | - |
dc.citation.volume | 2 | - |
dc.citation.issue | 5 | - |
dc.citation.beginningpage | 2043 | - |
dc.citation.endingpage | 2046 | - |
dc.citation.publicationname | RSC ADVANCES | - |
dc.identifier.doi | 10.1039/c2ra01120d | - |
dc.contributor.localauthor | Jung, Hee-Tae | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | CAPILLARY FORCE LITHOGRAPHY | - |
dc.subject.keywordPlus | NANOWIRES | - |
dc.subject.keywordPlus | NANOPARTICLES | - |
dc.subject.keywordPlus | TRANSISTORS | - |
dc.subject.keywordPlus | PREPATTERN | - |
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