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Showing results 12881 to 12900 of 100108
| Atomic Layer Deposition Encapsulated Activated Carbon Electrodes for High Voltage Stable Supercapacitors Hong, Ki Joo; Cho, Moonkyu; Kim, Sang-Ouk, ACS APPLIED MATERIALS INTERFACES, v.7, no.3, pp.1899 - 1906, 2015-01 |
| Atomic layer deposition of Al2O3 thin films using trimethylaluminum and isopropyl alcohol Jeon, WS; Yang, S; Lee, CS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.6, pp.306 - 310, 2002-06 |
| Atomic Layer Deposition of Aluminum Thin Films Using an Alternating Supply of Trimethylaluminum and a Hydrogen Plasma Lee, Yong Ju; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.5, no.10, pp.C91 - C93, 2002-08 |
| Atomic layer deposition of environmentally benign SnTiOx as a potential ferroelectric material Chang, Siliang; Selvaraj, Sathees Kannan; Choi, Yoon-Young; Hong, Seungbum; Nakhmanson, Serge M.; Takoudis, Christos G., JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.34, no.1, 2016-01 |
| Atomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidant Maeng, W. J.; Choi, Dong-won; Park, Jozeph; Park, Jin-Seong, CERAMICS INTERNATIONAL, v.41, no.9, pp.10782 - 10787, 2015-11 |
Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks Ahn, Jinseong; Ahn, Changui; Jeon, Seokwoo; Park, Junyong, APPLIED SCIENCES-BASEL, v.9, no.10, pp.1 - 17, 2019-05 |
| Atomic layer deposition of nickel by the reduction of preformed nickel oxide Chae, Junghun; Park, Hyuong-Sang; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.5, no.6, pp.C64 - C66, 2002-06 |
| Atomic Layer Deposition of Ru Thin Film Using a Newly Synthesized Precursor with Open-Coordinated Ligands Oh, Seung Hoon; Hwang, Jeong Min; Park, Hyeonbin; Park, Dongseong; Song, Young Eun; Ko, Eun Chong; Park, Tae Joo; et al, ADVANCED MATERIALS INTERFACES, v.10, no.17, 2023-06 |
| Atomic layer deposition of ruthenium thin films for copper glue layer Kwon, OK; Kim, JH; Park, HS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.2, pp.G109 - G112, 2004-01 |
| Atomic layer deposition of silicon oxide thin films by alternating exposures to Si(2)Cl(6) and O(3) Lee, Seung-Won; Park, Kwangchol; Han, Byeol; Son, Sang-Ho; Rha, Sa-Kyun; Park, Chong-Ook; Lee, Won-Jun, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.7, pp.23 - 26, 2008 |
| Atomic Layer Deposition of TiN Thin Films by Alternate Supply of Tetrakis (ethymethylamino)-Titanium and Ammonia Min, Jae-Sik; Son, Young-Woong; Kang, Won-Gu; Chun, Soung-Soon; Kang, Sang-Won, JAPANESE JOURNAL OF APPLIED PHYSICS, v.37, no.0, pp.4999 - 5004, 1999 |
| Atomic Layer Etching Mechanism of MoS2 for Nanodevices Kim, Ki Seok; Kim, Ki Hyun; Nam, Yeonsig; Jeon, Jaeho; Yim, Soonmin; Singh, Eric; Lee, Jin Yong; et al, ACS APPLIED MATERIALS & INTERFACES, v.9, no.13, pp.11967 - 11976, 2017-04 |
| Atomic Layer-by-Layer Thermoelectric Conversion in Topological Insulator Bismuth/Antimony Tellurides Sung, Ji Ho; Heo, Hoseok; Hwang, Inchan; Lim, Myungsoo; Lee, Donghun; Kang, Kibum; Choi, Hee Cheul; et al, NANO LETTERS, v.14, no.7, pp.4030 - 4035, 2014-07 |
| Atomic model for blue luminescences in Mg-doped GaN Lee, SG; Chang, Kee-Joo, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.14, no.2, pp.138 - 142, 1999-02 |
| ATOMIC MODEL FOR HYDROGEN PASSIVATION OF DX CENTERS IN GAAS AND ALXGA1-XAS ALLOYS Chang, Kee-Joo; CHEONG, BH; PARK, CH, SOLID STATE COMMUNICATIONS, v.84, no.11, pp.1005 - 1009, 1992-12 |
| Atomic model for the donor compensation in Cl-doped ZnTe Lee, SG; Chang, Kee-Joo, PHYSICAL REVIEW B, v.57, no.11, pp.6239 - 6242, 1998-03 |
| Atomic model for the electrical deactivation of N in Si oxynitrides Lee, EC; Chang, Kee-Joo, PHYSICA B-CONDENSED MATTER, v.340, pp.974 - 977, 2003-12 |
| Atomic models for anionic ligand passivation of cation-rich surfaces of IV-VI, II-VI, and III-V colloidal quantum dots Ko, Jae Hyeon; Yoo, Dongsuk; Kim, Yong-Hyun, CHEMICAL COMMUNICATIONS, v.53, no.2, pp.388 - 391, 2017-01 |
| Atomic photoionization cross sections beyond the electric dipole approximation Brumboiu, Iulia Emilia; Eriksson, Olle; Norman, Patrick, JOURNAL OF CHEMICAL PHYSICS, v.150, no.4, 2019-01 |
| Atomic processes leading to asymmetric divertor detachment in KSTAR L-mode plasmas Park, Jae Sun; Groth, Mathias; Pitts, Richard; Bak, Jun-Gyo; Thatipamula, S. G.; Juhn, June-Woo; Hong, Suk-Ho; et al, NUCLEAR FUSION, v.58, no.12, pp.126033, 2018-12 |
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