Complex self-assembled patterns using sparse commensurate templates with locally varying motifs

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Templated self-assembly of block copolymer thin films can generate periodic arrays of microdomains within a sparse template, or complex patterns using 1: 1 templates(1-16). However, arbitrary pattern generation directed by sparse templates remains elusive. Here, we show that an array of carefully spaced and shaped posts, prepared by electron-beam patterning of an inorganic resist, can be used to template complex patterns in a cylindrical-morphology block copolymer. We use two distinct methods: making the post spacing commensurate with the equilibrium periodicity of the polymer, which controls the orientation of the linear features, and making local changes to the shape or distribution of the posts, which direct the formation of bends, junctions and other aperiodic features in specific locations. The first of these methods permits linear patterns to be directed by a sparse template that occupies only a few percent of the area of the final self-assembled pattern, while the second method can be used to selectively and locally template complex linear patterns.
Publisher
NATURE PUBLISHING GROUP
Issue Date
2010-04
Language
English
Article Type
Article
Keywords

BLOCK-COPOLYMER LITHOGRAPHY; DIBLOCK COPOLYMER; SQUARE ARRAYS; NANOLITHOGRAPHY; GRAPHOEPITAXY; ALIGNMENT; POLYMERS

Citation

NATURE NANOTECHNOLOGY, v.5, no.4, pp.256 - 260

ISSN
1748-3387
DOI
10.1038/nnano.2010.30
URI
http://hdl.handle.net/10203/99689
Appears in Collection
MS-Journal Papers(저널논문)
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