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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector Belau, L; Park, JeongYoung; Liang, T; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.27, no.4, pp.1919 - 1925, 2009-07 | |
| The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks Belau, L; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.26, no.6, pp.2225 - 2229, 2008-11 | |
| Electrochemically Enhanced Wet Cleaning of Ru Capping Thin Film for EUV Lithography Reflector Seo, H; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.157, no.4, pp.414 - 419, 2010 | |
| Improved oxidation resistance of Ru/Si capping layer for extreme ultraviolet lithography reflector Park, JeongYoung; Belau, L; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.29, no.4, 2011-07 |
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