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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Atomic force microscopy study of the mechanical and electrical properties of monolayer films of molecules with aromatic end groups Fang, L; Park, JeongYoung; Ma, H; Jen, AKY; Salmeron, M, LANGMUIR, v.23, no.23, pp.11522 - 11525, 2007-11 | |
| Dynamics of surface catalyzed reactions; the roles of surface defects, surface diffusion, and hot electrons Somorjai, GA; Bratlie, KM; Montano, MO; Park, JeongYoung, JOURNAL OF PHYSICAL CHEMISTRY B, v.110, no.40, pp.20014 - 20022, 2006-10 | |
| Spiers Memorial Lecture - Molecular mechanics and molecular electronics Beckman, R; Beverly, K; Boukai, A; Bunimovich, Y; Choi, Jang Wook; DeIonno, E; Green, J; Johnston-Halperin, E; Luo, Y; Sheriff, B; Stoddart, JF; Heath, JR, FARADAY DISCUSSIONS, v.131, pp.9 - 22, 2006 | |
| Atomic scale coexistence of periodic and quasiperiodic order in a 2-fold Al-Ni-Co decagonal quasicrystal surface Park, JeongYoung; Ogletree, DF; Salmeron, M; Ribeiro, RA; Canfield, PC; Jenks, CJ; Thiel, PA, PHYSICAL REVIEW B, v.72, no.22, 2005-12 | |
| The mechanism of HF/H2O chemical etching of SiO2 Kang, Jeung Ku; Musgrave, CB, JOURNAL OF CHEMICAL PHYSICS, v.116, no.1, pp.275 - 280, 2002-01 | |
| Study of strain softening behavior of Al-Al3Sc multilayers using microcompression testing Han, Seung Min J.; Phillips, Mark A.; Nix, William D., ACTA MATERIALIA, v.57, no.15, pp.4473 - 4490, 2009-09 | |
| Partitioning of Poly(amidoamine) Dendrimers between n-Octanol and Water Giri, J; Diallo, Mamadou S; Goddard, WA; Dalleska, NF; Fang, XD; Tang, YC, ENVIRONMENTAL SCIENCE TECHNOLOGY, v.43, no.13, pp.5123 - 5129, 2009-07 | |
| Hydrogen storage in LiAlH4: Predictions of the crystal structures and reaction mechanisms of intermediate phases from quantum mechanics Kang, Jeung Ku; Lee, JY; Muller, RP; Goddard, WA, JOURNAL OF CHEMICAL PHYSICS, v.121, no.21, pp.10623 - 10633, 2004-12 | |
| Electrical transport and mechanical properties of alkylsilane self-assembled monolayers on silicon surfaces probed by atomic force microscopy Park, JeongYoung; Qi, YB; Ashby, PD; Hendriksen, BLM; Salmeron, M, JOURNAL OF CHEMICAL PHYSICS, v.130, no.11, 2009-03 | |
| Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector Belau, L; Park, JeongYoung; Liang, T; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.27, no.4, pp.1919 - 1925, 2009-07 |
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