Showing results 1 to 2 of 2
Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector Belau, L; Park, JeongYoung; Liang, T; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.27, no.4, pp.1919 - 1925, 2009-07 |
Unexpected Carbon Dioxide Inclusion in Water-Saturated Pores of Metal-Organic Frameworks with Potential for Highly Selective Capture of CO2 Kim, Dae-Ok; Lim, Hyung Kyu; Ro, Hyeyoon; Kim, Hyung-Jun; Lee, Huen, CHEMISTRY-A EUROPEAN JOURNAL, v.21, no.3, pp.1125 - 1129, 2015-01 |
Discover