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Showing results 1 to 8 of 8

1
Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector

Belau, L; Park, JeongYoung; Liang, T; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.27, no.4, pp.1919 - 1925, 2009-07

2
Domain structures of single layer graphene imaged with conductive probe atomic force microscopy

Kwon, Sangku; Chung, H. J.; Seo, Sunae; Park, Jeong Young, SURFACE AND INTERFACE ANALYSIS, v.44, no.6, pp.768 - 771, 2012-06

3
Electrical transport and mechanical properties of alkylsilane self-assembled monolayers on silicon surfaces probed by atomic force microscopy

Park, JeongYoung; Qi, YB; Ashby, PD; Hendriksen, BLM; Salmeron, M, JOURNAL OF CHEMICAL PHYSICS, v.130, no.11, 2009-03

4
Friction and adhesion properties of clean and oxidized Al-Ni-Co decagonal quasicrystals: a UHV atomic force microscopy/scanning tunneling microscopy study

Park, JeongYoung; Ogletree, DF; Salmeron, M; Jenks, CJ; Thiel, PA, TRIBOLOGY LETTERS, v.17, no.3, pp.629 - 636, 2004-10

5
Improved oxidation resistance of Ru/Si capping layer for extreme ultraviolet lithography reflector

Park, JeongYoung; Belau, L; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.29, no.4, 2011-07

6
Large changes of graphene conductance as a function of lattice orientation between stacked layers

Lee, Hyun Soo; Qi, Yabing; Kwon, Sangku; Salmeron, Miquel; Park, JeongYoung, NANOTECHNOLOGY, v.26, no.1, 2015-01

7
Probing Nanotribological and Electrical Properties of Organic Molecular Films with Atomic Force Microscopy

Park, JeongYoung; Qi, YB, SCANNING, v.32, no.5, pp.257 - 264, 2010-09

8
The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks

Belau, L; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.26, no.6, pp.2225 - 2229, 2008-11

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