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Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) for 100 mu m-thick submicron patterns with an aspect ratio over 100

Kim, Kwanghyun; Yu, Sunyoung; Kim, Sung-Wook; Kim, Taegeon; Kim, Sang-Min; Kang, Se-Young; Han, Seung Min; et al, CHEMICAL COMMUNICATIONS, v.53, no.58, pp.8172 - 8175, 2017-07

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