Showing results 1 to 4 of 4
Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector Belau, L; Park, JeongYoung; Liang, T; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.27, no.4, pp.1919 - 1925, 2009-07 |
Electrochemically Enhanced Wet Cleaning of Ru Capping Thin Film for EUV Lithography Reflector Seo, H; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.157, no.4, pp.414 - 419, 2010 |
Improved oxidation resistance of Ru/Si capping layer for extreme ultraviolet lithography reflector Park, JeongYoung; Belau, L; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.29, no.4, 2011-07 |
Random and V-groove texturing for efficient light trapping in organic photovoltaic cells Cho, Changsoon; Kim, Hoyeon; Jeong, Seonju; Baek, Se Woong; Seo, Ji Won; Han, Donggeon; Kim, Kyoohyun; et al, SOLAR ENERGY MATERIALS AND SOLAR CELLS, v.115, pp.36 - 41, 2013-08 |
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