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1
Fabrication of 50 nm trigate silicon on insulator metal-oxide-silicon field-effect transistor without source/drain activation annealing

Im, Kiju; Cho, Won-Ju; Ahn, Chang-Geun; Yang, Jong-Heon; Oh, Jihun; Lee, Seongjae; Hwang, Hyunsang, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, v.43, no.5A, pp.2438 - 2441, 2004-05

2
Fabrication of 50-nm gate SOI n-MOSFETs using novel plasma-doping technique

Cho, WJ; Ahn, CG; Im, KJ; Yang, JH; Oh, Jihun; Baek, IB; Lee, S, IEEE ELECTRON DEVICE LETTERS, v.25, no.6, pp.366 - 368, 2004-06

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