Showing results 1 to 4 of 4
Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector Belau, L; Park, JeongYoung; Liang, T; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.27, no.4, pp.1919 - 1925, 2009-07 |
Improved oxidation resistance of Ru/Si capping layer for extreme ultraviolet lithography reflector Park, JeongYoung; Belau, L; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.29, no.4, 2011-07 |
Reversible Oxygen-Driven Nickel Oxide Structural Transition on the Nickel(111) Surface at Near-Ambient Pressure Noh, Myung Cheol; Kim, Jeongjin; Doh, Won Hui; Kim, Ki-Jeong; Park, Jeong Young, CHEMCATCHEM, v.10, no.9, pp.2046 - 2050, 2018-05 |
The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks Belau, L; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.26, no.6, pp.2225 - 2229, 2008-11 |
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