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Electrochemically Enhanced Wet Cleaning of Ru Capping Thin Film for EUV Lithography Reflector Seo, H; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.157, no.4, pp.414 - 419, 2010 |
The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks Belau, L; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.26, no.6, pp.2225 - 2229, 2008-11 |
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