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Showing results 1 to 3 of 3

1
Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector

Belau, L; Park, JeongYoung; Liang, T; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.27, no.4, pp.1919 - 1925, 2009-07

2
Electrochemically Enhanced Wet Cleaning of Ru Capping Thin Film for EUV Lithography Reflector

Seo, H; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.157, no.4, pp.414 - 419, 2010

3
Improved oxidation resistance of Ru/Si capping layer for extreme ultraviolet lithography reflector

Park, JeongYoung; Belau, L; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.29, no.4, 2011-07

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