Browse "Graduate school of EEWS(EEWS대학원)" by Author Liang, T

Showing results 1 to 3 of 3

1
Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector

Belau, L; Park, JeongYoung; Liang, T; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.27, no.4, pp.1919 - 1925, 2009-07

2
Electrochemically Enhanced Wet Cleaning of Ru Capping Thin Film for EUV Lithography Reflector

Seo, H; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.157, no.4, pp.414 - 419, 2010

3
The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks

Belau, L; Park, JeongYoung; Liang, T; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.26, no.6, pp.2225 - 2229, 2008-11

rss_1.0 rss_2.0 atom_1.0