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Showing results 1 to 4 of 4

1
A facile method for the selective decoration of graphene defects based on a galvanic displacement reaction

Hong, Juree; Lee, Jae-Bok; Lee, Sanggeun; Seo, Jungmok; Lee, Hyunsoo; Park, Jeong Young; Ahn, Jong-Hyun; et al, NPG ASIA MATERIALS, v.8, 2016-04

2
Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors

Khan, Rizwan; Shong, Bonggeun; Ko, Byeong Guk; Lee, Jae Kwang; Lee, Hyunsoo; Park, Jeong Young; Oh, Il-Kwon; et al, CHEMISTRY OF MATERIALS, v.30, no.21, pp.7603 - 7610, 2018-11

3
High efficiency n-Si/p-Cu2O core-shell nanowires photodiode prepared by atomic layer deposition of Cu2O on well-ordered Si nanowires array

Kim, Hangil; Kim, Soo-Hyun; Ko, Kyung Yong; Kim, Hyungjun; Kim, Jaehoon; Oh, Jihun; Lee, Han-Bo-Ram, ELECTRONIC MATERIALS LETTERS, v.12, no.3, pp.404 - 410, 2016-05

4
Internal and External Atomic Steps in Graphite Exhibit Dramatically Different Physical and Chemical Properties

Lee, Hyun Soo; Lee, Han-Bo-Ram; Kwon, Sangku; Salmeron, Miquel; Park, JeongYoung, ACS NANO, v.9, no.4, pp.3814 - 3819, 2015-04

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