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Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors

Khan, Rizwan; Shong, Bonggeun; Ko, Byeong Guk; Lee, Jae Kwang; Lee, Hyunsoo; Park, Jeong Young; Oh, Il-Kwon; et al, CHEMISTRY OF MATERIALS, v.30, no.21, pp.7603 - 7610, 2018-11

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