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Channel Strain Measurement of Si1-xCx Structures: Effects of Gate Length, Source/Drain Length, and Source/Drain Elevation Kim, Sun-Wook; Byun, Dae-Seop; Jung, Mijin; Chopra, Saurabh; Kim, Yihwan; Kim, Jae-Hyun; Han, Seung Min J.; et al, APPLIED PHYSICS EXPRESS, v.6, no.6, 2013-06 |
Mechanics-driven patterning of CVD graphene for roll-based manufacturing process Kim, Sangmin; Jang, Bongkyun; Jo, Kyungmin; Kim, Donghyuk; Lee, Jihye; Kim, Kyung-Shik; Lee, Seung-Mo; et al, 2D MATERIALS, v.4, no.2, 2017-06 |
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