High-Throughput Near-Field Optical Nanoprocessing of Solution-Deposited Nanoparticles

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dc.contributor.authorPan, Hengko
dc.contributor.authorHwang, David J.ko
dc.contributor.authorKo, Seung Hwanko
dc.contributor.authorClem, Tabitha A.ko
dc.contributor.authorFrechet, Jean M. J.ko
dc.contributor.authorGrigoropoulos, Costas P.ko
dc.date.accessioned2013-03-11T08:21:25Z-
dc.date.available2013-03-11T08:21:25Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2010-08-
dc.identifier.citationSMALL, v.6, no.16, pp.1812 - 1821-
dc.identifier.issn1613-6810-
dc.identifier.urihttp://hdl.handle.net/10203/98775-
dc.description.abstractThe application of nanoscale electrical and biological devices will benefit from the development of nanomanufacturing technologies that are highthroughput, low-cost, and flexible. Utilizing nanomaterials as building blocks and organizing them in a rational way constitutes an attractive approach towards this goal and has been pursued for the past few years. The optical near-field nanoprocessing of nanoparticles for high-throughput nanomanufacturing is reported. The method utilizes fluidically assembled micro,spheres as a near-field optical confinement structure array for laserassisted nanosintering and nanoablation of nanoparticles. By taking advantage of the low processing temperature and reduced thermal diffusion in the nanoparticle film, a minimum feature size down to approximate to 100 nm is realized. In addition, smaller features (50 nm) are obtained by furnace annealing of laser-sintered nanodots at 400 degrees C. The electrical conductivity of sintered nanolines is also studied. Using nanoline electrodes separated by a submicrometer gap, organic field-effect transistors are subsequently fabricated with oxygen-stable semiconducting polymer.-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectA-SIO2 MICROSPHERES-
dc.subjectARRAYS-
dc.subjectLITHOGRAPHY-
dc.subjectRESOLUTION-
dc.subjectSILICON-
dc.subjectNANOLITHOGRAPHY-
dc.subjectFABRICATION-
dc.subjectMONOLAYERS-
dc.subjectNANOSCALE-
dc.subjectFUTURE-
dc.titleHigh-Throughput Near-Field Optical Nanoprocessing of Solution-Deposited Nanoparticles-
dc.typeArticle-
dc.identifier.wosid000281495800017-
dc.identifier.scopusid2-s2.0-77955636782-
dc.type.rimsART-
dc.citation.volume6-
dc.citation.issue16-
dc.citation.beginningpage1812-
dc.citation.endingpage1821-
dc.citation.publicationnameSMALL-
dc.identifier.doi10.1002/smll.201000345-
dc.contributor.localauthorKo, Seung Hwan-
dc.contributor.nonIdAuthorPan, Heng-
dc.contributor.nonIdAuthorHwang, David J.-
dc.contributor.nonIdAuthorClem, Tabitha A.-
dc.contributor.nonIdAuthorFrechet, Jean M. J.-
dc.contributor.nonIdAuthorGrigoropoulos, Costas P.-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorlasers-
dc.subject.keywordAuthornanoparticles-
dc.subject.keywordAuthororganic field-effect transistors-
dc.subject.keywordAuthorpatterning-
dc.subject.keywordAuthorprocessing-
dc.subject.keywordPlusA-SIO2 MICROSPHERES-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusLITHOGRAPHY-
dc.subject.keywordPlusRESOLUTION-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusNANOLITHOGRAPHY-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusMONOLAYERS-
dc.subject.keywordPlusNANOSCALE-
dc.subject.keywordPlusFUTURE-
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