Fiber laser annealing of indium-tin-oxide nanoparticles for large area transparent conductive layers and optical film characterization

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dc.contributor.authorPan, Hengko
dc.contributor.authorLee, Daehoko
dc.contributor.authorKo, Seung Hwanko
dc.contributor.authorGrigoropoulos, Costas P.ko
dc.contributor.authorPark, Hee K.ko
dc.contributor.authorHoult, Tonyko
dc.date.accessioned2013-03-11T08:20:20Z-
dc.date.available2013-03-11T08:20:20Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2011-07-
dc.identifier.citationAPPLIED PHYSICS A-MATERIALS SCIENCE PROCESSING, v.104, no.1, pp.29 - 38-
dc.identifier.issn0947-8396-
dc.identifier.urihttp://hdl.handle.net/10203/98772-
dc.description.abstractIndium tin oxide (ITO) coatings are widely used as transparent electrodes for optoelectronic devices. The most common preparation methods are sputtering, evaporation, and wet chemical deposition. ITO coatings can also be manufactured by solution deposition of ITO nanoparticles followed by furnace thermal annealing with the major motivation to reduce equipment investment. However, conventional furnace annealing is energy intensive, slow, and limited by the peak processing temperature. To overcome these constraints, we suggest using a laser beam for ITO nanoparticle annealing over a large area. It is shown in the present study that a low cost, high power, and high efficiency laser can yield large area functional ITO films in a process that carries substantial promise for potential industrial implementation. Furthermore, laser annealing generates higher electrical conductivity than conventional, thermally annealed nanoparticle films. The optical and electrical properties of the annealed ITO films can also be altered by adjusting laser parameters and environmental gases.-
dc.languageEnglish-
dc.publisherSPRINGER-
dc.subjectCHEMICAL VAPOR-DEPOSITION-
dc.subjectELECTRICAL-PROPERTIES-
dc.subjectTHIN-FILMS-
dc.subjectEVAPORATION-
dc.subjectAIR-
dc.titleFiber laser annealing of indium-tin-oxide nanoparticles for large area transparent conductive layers and optical film characterization-
dc.typeArticle-
dc.identifier.wosid000291652600005-
dc.identifier.scopusid2-s2.0-79959230803-
dc.type.rimsART-
dc.citation.volume104-
dc.citation.issue1-
dc.citation.beginningpage29-
dc.citation.endingpage38-
dc.citation.publicationnameAPPLIED PHYSICS A-MATERIALS SCIENCE PROCESSING-
dc.identifier.doi10.1007/s00339-011-6397-x-
dc.contributor.localauthorKo, Seung Hwan-
dc.contributor.nonIdAuthorPan, Heng-
dc.contributor.nonIdAuthorLee, Daeho-
dc.contributor.nonIdAuthorGrigoropoulos, Costas P.-
dc.contributor.nonIdAuthorPark, Hee K.-
dc.contributor.nonIdAuthorHoult, Tony-
dc.type.journalArticleArticle-
dc.subject.keywordPlusCHEMICAL VAPOR-DEPOSITION-
dc.subject.keywordPlusELECTRICAL-PROPERTIES-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusEVAPORATION-
dc.subject.keywordPlusAIR-
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