Nonchemically amplified resists possessing cholate moiety for micropatterning of biomolecules

Abstract

Two novel monomers, containing diazoketo functional groups, cholic acid 3-diazo-3-ethoxycarbonyl-2-oxo-propyl ester methacrylate (CDEOPE-MA) and 2-diazo-6-hydroxy-3-oxo-hexanoic acid ethyl ester methacrylate (DHOHEE-MA), were designed and synthesized for biomolecular patterning applications. The polymers were synthesized by radical copolymerization of CDEOPE-MA, DHOHEE-MA, and gamma-butyrolacton-2-yl methacrylate. The patternability of the synthesized photoresist polymers were characterized by their lithographic evaluation. Introduction of cholate-monomer (CDEOPE-MA) seems to enhance the film formability as well as film stability in aqueous medium. DNA oligonucleotide patterning study was performed to demonstrate the applicability of this system for biomolecular patterning. (C) 2010 Elsevier B.V. All rights reserved.