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College of Engineering(공과대학)Graduate school of EEWS(EEWS대학원)EEW-Journal Papers(저널논문)

Improved oxidation resistance of Ru/Si capping layer for extreme ultraviolet lithography reflector

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dc.contributor.authorPark, JeongYoungko
dc.contributor.authorBelau, Lko
dc.contributor.authorSeo, Hko
dc.contributor.authorSomorjai, GAko
dc.date.accessioned2013-03-09T21:18:47Z-
dc.date.available2013-03-09T21:18:47Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2011-07-
dc.identifier.citationJOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.29, no.4-
dc.identifier.issn1071-1023-
dc.identifier.urihttp://hdl.handle.net/10203/97483-
dc.description.abstractThe authors report on the chemical durability and oxidation resistance of Ru/Si, Ru/B, Ru/C, and Ru capping layers on the extreme ultraviolet (EUV) reflector surface. Surface etching and changes in the oxidation state were probed with x-ray photoelectron spectroscopy. The changes in surface morphology and roughness are characterized using scanning electron microscopy and atomic force microscopy. Out of four different capping layers, Ru/Si layers exhibited the least surface oxidation after oxygen plasma and UV/ozone treatment, indicating a superior oxidation resistance. The authors found that the reflectivity of the Ru/Si capped reflector is similar to that of a bare Ru capped reflector. This study suggests that a Ru/Si layer can be an excellent capping layer for the EUV reflector. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3596560]-
dc.languageEnglish-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectMASK BLANKS-
dc.subjectRU FILMS-
dc.subjectOZONE-
dc.subjectRUTHENIUM-
dc.subjectREMOVAL-
dc.subjectSURFACE-
dc.subjectNANOPARTICLES-
dc.subjectREDUCTION-
dc.subjectOPTICS-
dc.subjectPLASMA-
dc.titleImproved oxidation resistance of Ru/Si capping layer for extreme ultraviolet lithography reflector-
dc.typeArticle-
dc.identifier.wosid000293854800021-
dc.identifier.scopusid2-s2.0-80051906973-
dc.type.rimsART-
dc.citation.volume29-
dc.citation.issue4-
dc.citation.publicationnameJOURNAL OF VACUUM SCIENCE TECHNOLOGY B-
dc.contributor.localauthorPark, JeongYoung-
dc.contributor.nonIdAuthorBelau, L-
dc.contributor.nonIdAuthorSeo, H-
dc.contributor.nonIdAuthorSomorjai, GA-
dc.type.journalArticleArticle-
dc.subject.keywordAuthoratomic force microscopy-
dc.subject.keywordAuthorboron-
dc.subject.keywordAuthorcarbon-
dc.subject.keywordAuthordurability-
dc.subject.keywordAuthoretching-
dc.subject.keywordAuthoroxidation-
dc.subject.keywordAuthorplasma materials processing-
dc.subject.keywordAuthorreflectivity-
dc.subject.keywordAuthorruthenium-
dc.subject.keywordAuthorscanning electron microscopy-
dc.subject.keywordAuthorsilicon-
dc.subject.keywordAuthorsurface morphology-
dc.subject.keywordAuthorsurface roughness-
dc.subject.keywordAuthorultraviolet lithography-
dc.subject.keywordAuthorX-ray photoelectron spectra-
dc.subject.keywordPlusMASK BLANKS-
dc.subject.keywordPlusRU FILMS-
dc.subject.keywordPlusOZONE-
dc.subject.keywordPlusRUTHENIUM-
dc.subject.keywordPlusREMOVAL-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusNANOPARTICLES-
dc.subject.keywordPlusREDUCTION-
dc.subject.keywordPlusOPTICS-
dc.subject.keywordPlusPLASMA-
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EEW-Journal Papers(저널논문)
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