DC Field | Value | Language |
---|---|---|
dc.contributor.author | Banerjee, Parag | ko |
dc.contributor.author | Lee, Won-Jae | ko |
dc.contributor.author | Bae, Ki-Ryeol | ko |
dc.contributor.author | Lee, Sang Bok | ko |
dc.contributor.author | Rubloff, Gary W. | ko |
dc.date.accessioned | 2013-03-09T08:43:16Z | - |
dc.date.available | 2013-03-09T08:43:16Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2010-08 | - |
dc.identifier.citation | JOURNAL OF APPLIED PHYSICS, v.108, no.4 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.uri | http://hdl.handle.net/10203/95900 | - |
dc.description.abstract | Al-doped ZnO (AZO) films of similar to 100 nm thickness with various Al doping were prepared at 150 degrees C by atomic layer deposition on quartz substrates. At low Al doping, the films were strongly textured along the [100] direction, while at higher Al doping the films remained amorphous. Atomic force microscopy results showed that Al-O cycles when inserted in a ZnO film, corresponding to a few atomic percent Al, could remarkably reduce the surface roughness of the films. Hall measurements revealed a maximum mobility of 17.7 cm(2)/V s. Film resistivity reached a minima of 4.4 X 10(-3) Omega cm whereas the carrier concentration reached a maxima of 1.7 X 10(20) cm(-3), at 3 at. % Al. The band gap of AZO films varied from 3.23 eV for undoped ZnO films to 3.73 eV for AZO films with 24.6 at. % Al. Optical transmittance over 80% was obtained in the visible region. The detrimental impact of increased Al resulting in decreased conductivity due to doping past 3.0 at. % is evident in the x-ray diffraction data, as an abrupt increase in the optical band gap and as a deviation from the Burstein-Moss effect. (C) 2010 American Institute of Physics. [doi:10.1063/1.3466987] | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | PULSED-LASER DEPOSITION | - |
dc.subject | THIN-FILMS | - |
dc.subject | ZINC-OXIDE | - |
dc.subject | GROWTH | - |
dc.subject | TRANSPARENT | - |
dc.subject | ALUMINUM | - |
dc.title | Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films | - |
dc.type | Article | - |
dc.identifier.wosid | 000281857100035 | - |
dc.identifier.scopusid | 2-s2.0-77956336658 | - |
dc.type.rims | ART | - |
dc.citation.volume | 108 | - |
dc.citation.issue | 4 | - |
dc.citation.publicationname | JOURNAL OF APPLIED PHYSICS | - |
dc.identifier.doi | 10.1063/1.3466987 | - |
dc.contributor.nonIdAuthor | Banerjee, Parag | - |
dc.contributor.nonIdAuthor | Lee, Won-Jae | - |
dc.contributor.nonIdAuthor | Bae, Ki-Ryeol | - |
dc.contributor.nonIdAuthor | Rubloff, Gary W. | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | PULSED-LASER DEPOSITION | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | ZINC-OXIDE | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordPlus | TRANSPARENT | - |
dc.subject.keywordPlus | ALUMINUM | - |
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