DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeong, S | ko |
dc.contributor.author | Hu, LB | ko |
dc.contributor.author | Lee, HR | ko |
dc.contributor.author | Garnett, E | ko |
dc.contributor.author | Choi, Jang Wook | ko |
dc.contributor.author | Cui, Y | ko |
dc.date.accessioned | 2013-03-09T00:41:20Z | - |
dc.date.available | 2013-03-09T00:41:20Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2010-08 | - |
dc.identifier.citation | NANO LETTERS, v.10, no.8, pp.2989 - 2994 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | http://hdl.handle.net/10203/94843 | - |
dc.description.abstract | Recently, there have been several studies demonstrating that highly ordered nanoscale texturing can dramatically increase performance of applications such as light absorption in thin-film solar cells. However, those methods used to make the nanostructures are not compatible with large-scale fabrication. Here we demonstrate that a technique currently used in roll-to-roll processing to deposit uniform thin films from solution, a wire-wound rod coating method, can be adapted to deposit close-packed monolayers or multilayers of silica nanoparticles on a variety of rigid and flexible substrates. Amorphous silicon thin films deposited on these nanoparticle monolayers exhibit 42% higher absorption over the integrated AM 1.5 spectrum than the planar controls. This simple assembly technique can be used to improve solar cells, fuel cells, light emitting diodes and other devices where ordered nanoscale texturing is critical for optimal performance. | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | GECKO FOOT-HAIR | - |
dc.subject | SILICON NANOWIRE | - |
dc.subject | STRIPE PATTERNS | - |
dc.subject | FABRICATION | - |
dc.subject | ABSORPTION | - |
dc.subject | PARTICLES | - |
dc.subject | SURFACES | - |
dc.subject | ARRAYS | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | SIZE | - |
dc.title | Fast and Scalable Printing of Large Area Monolayer Nanoparticles for Nanotexturing Applications | - |
dc.type | Article | - |
dc.identifier.wosid | 000280728900043 | - |
dc.identifier.scopusid | 2-s2.0-77955563758 | - |
dc.type.rims | ART | - |
dc.citation.volume | 10 | - |
dc.citation.issue | 8 | - |
dc.citation.beginningpage | 2989 | - |
dc.citation.endingpage | 2994 | - |
dc.citation.publicationname | NANO LETTERS | - |
dc.identifier.doi | 10.1021/nl101432r | - |
dc.contributor.localauthor | Choi, Jang Wook | - |
dc.contributor.nonIdAuthor | Jeong, S | - |
dc.contributor.nonIdAuthor | Hu, LB | - |
dc.contributor.nonIdAuthor | Lee, HR | - |
dc.contributor.nonIdAuthor | Garnett, E | - |
dc.contributor.nonIdAuthor | Cui, Y | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | Nanotexture | - |
dc.subject.keywordAuthor | printing | - |
dc.subject.keywordAuthor | roll-to-roll | - |
dc.subject.keywordAuthor | light trapping | - |
dc.subject.keywordAuthor | nanoparticle | - |
dc.subject.keywordPlus | GECKO FOOT-HAIR | - |
dc.subject.keywordPlus | SILICON NANOWIRE | - |
dc.subject.keywordPlus | STRIPE PATTERNS | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | ABSORPTION | - |
dc.subject.keywordPlus | PARTICLES | - |
dc.subject.keywordPlus | SURFACES | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | SIZE | - |
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