Spectrally resolved white-light interferometry for 3D inspection of a thin-film layer structure

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We describe an improved scheme of spectrally resolved white-light interferometry, which provides 3D visual inspection of a thin-film layer structure with nanometer level resolutions. Compared to the authors' previous method [Appl. Phys. Lett. 91, 091903 (2007)], 3D tomographic information of thin films can be obtained by decoupling the film thickness and top surface profile, which is embodied by inducing spectral carrier frequency to the reference arm and applying a low-pass filter to the interferogram instead of two troublesome measurement steps of activating and deactivating a mechanical shutter. We test and verify our proposed method by measuring a patterned thin-film layer structure as well as standard specimens of thin films with various thicknesses. (C) 2009 Optical Society of America
Publisher
OPTICAL SOC AMER
Issue Date
2009-02
Language
English
Article Type
Article
Keywords

BEAM-PROFILE REFLECTOMETRY; THICKNESS-PROFILE; SCANNING INTERFEROMETRY

Citation

APPLIED OPTICS, v.48, no.4, pp.799 - 803

ISSN
0003-6935
DOI
10.1364/AO.48.000799
URI
http://hdl.handle.net/10203/94600
Appears in Collection
ME-Journal Papers(저널논문)
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