Quantum simulation of resonant tunneling in nanoscale tunnel transistors

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dc.contributor.authorShin, Mincheolko
dc.contributor.authorJang, Mko
dc.contributor.authorLee, Sko
dc.date.accessioned2013-03-08T04:42:20Z-
dc.date.available2013-03-08T04:42:20Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2006-03-
dc.identifier.citationJOURNAL OF APPLIED PHYSICS, v.99, no.6, pp.65 - 70-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/10203/92187-
dc.description.abstractWe have performed ballistic and diffusive quantum simulations of resonant tunneling in nanoscale tunnel transistors. We have investigated three factors, temperature, interference, and diffusive scattering, which may affect the resonant tunneling effect in the devices. Our simulations indicate that if the channel length and depth are in the order of tens of nanometers and a few nanometers, respectively, and the electron mean free path in the channel region is in the order of tens of nanometers, the current oscillations and the negative differential resistance behavior due to resonant tunneling may be observed at room temperature. (c) 2006 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.titleQuantum simulation of resonant tunneling in nanoscale tunnel transistors-
dc.typeArticle-
dc.identifier.wosid000236464400100-
dc.identifier.scopusid2-s2.0-33645661460-
dc.type.rimsART-
dc.citation.volume99-
dc.citation.issue6-
dc.citation.beginningpage65-
dc.citation.endingpage70-
dc.citation.publicationnameJOURNAL OF APPLIED PHYSICS-
dc.identifier.doi10.1063/1.2183348-
dc.contributor.localauthorShin, Mincheol-
dc.contributor.nonIdAuthorJang, M-
dc.contributor.nonIdAuthorLee, S-
dc.type.journalArticleArticle-
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