Control of electron density and temperature with a modified capacitive discharge

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dc.contributor.authorYou, SJko
dc.contributor.authorBai, KHko
dc.contributor.authorChae, SHko
dc.contributor.authorChang, Hong-Youngko
dc.date.accessioned2013-03-08T00:40:31Z-
dc.date.available2013-03-08T00:40:31Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2005-06-
dc.identifier.citationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.25, pp.245 - 254-
dc.identifier.issn0272-4324-
dc.identifier.urihttp://hdl.handle.net/10203/91621-
dc.description.abstractWe propose a new type of capacitive plasma source with a mesh grid to solve the problems of previous low pressure discharges, the inability to control the electron density and temperature independently, i.e. just one value of electron temperature is possible for a given electron density. While varying the grid bias and the discharge current, various electron temperatures are possible for a given electron density, and the electron density and temperature can be controlled from 4 x 10(8) cm(-3) to 1 x 10(10) cm(3) and from 1 to 4 eV, respectively.-
dc.languageEnglish-
dc.publisherSPRINGER-
dc.subjectPLASMA-
dc.titleControl of electron density and temperature with a modified capacitive discharge-
dc.typeArticle-
dc.identifier.wosid000228266200004-
dc.identifier.scopusid2-s2.0-17444393257-
dc.type.rimsART-
dc.citation.volume25-
dc.citation.beginningpage245-
dc.citation.endingpage254-
dc.citation.publicationnamePLASMA CHEMISTRY AND PLASMA PROCESSING-
dc.identifier.doi10.1007/s11090-004-3038-6-
dc.contributor.localauthorChang, Hong-Young-
dc.contributor.nonIdAuthorYou, SJ-
dc.contributor.nonIdAuthorBai, KH-
dc.contributor.nonIdAuthorChae, SH-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorplasma parameters-
dc.subject.keywordAuthorelectron energy distribution functions-
dc.subject.keywordPlusPLASMA-
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