X-ray absorption near-edge structure and optical properties of hafnium oxynitride thin films

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Using the suggested local structures of HfO2 (coordination number: 7.0), Hf4O5N2 (6.25), and Hf4O2N4 (5.5) in the previous research, we analyzed the effects of film composition on the X-ray absorption near-edge structure (XANES) spectra for O K-edge and N K-edge of hafnium oxynitride (Hf-O-N) thin films. The dispersion of optical constants for Hf-O-N thin films was analyzed using a four-phase model of ambient/graded/film/substrate for spectroscopy ellipsometry analysis. Two Cody-Lorentz models were applied for the spectroscopy ellipsometry analysis of films based on the XANES spectra. The effects of film composition on the dispersion of optical constants and on the surface degradation were analyzed.
Publisher
ELSEVIER ACADEMIC PRESS INC
Issue Date
2008
Language
English
Article Type
Article; Proceedings Paper
Keywords

SEMICONDUCTORS

Citation

ADVANCES IN QUANTUM CHEMISTRY, VOL 54: DV-X ALPHA FOR INDUSTRIAL-ACADEMIC COOPERATION Book Series: ADVANCES IN QUANTUM CHEMISTRY, v.54, pp.81 - 88

ISSN
0065-3276
DOI
10.1016/S0065-3276(07)00007-X
URI
http://hdl.handle.net/10203/91305
Appears in Collection
MS-Journal Papers(저널논문)
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