DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, SH | ko |
dc.contributor.author | Lim, TW | ko |
dc.contributor.author | Yang, Dong-Yol | ko |
dc.contributor.author | Yi, SW | ko |
dc.contributor.author | Kong, Hong-Jin | ko |
dc.contributor.author | Lee, KS | ko |
dc.date.accessioned | 2013-03-07T16:41:33Z | - |
dc.date.available | 2013-03-07T16:41:33Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2005-09 | - |
dc.identifier.citation | JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS, v.14, pp.331 - 340 | - |
dc.identifier.issn | 0218-8635 | - |
dc.identifier.uri | http://hdl.handle.net/10203/90707 | - |
dc.description.abstract | Investigation into the methods of direct fabrication for submicron-detailed patterns without the use of any photomask was carried out using two-photon polymerization (TPP). Some patterns can be fabricated easily in the range of several micrometers by solidifying inside a photopolymerizable resin by a scanning process using a volume-pixel (voxel) matrix that is transformed from a bitmap figure file. The voxels are generated consecutively to merge into adjoining voxels in the process of fabricating a pattern. The resolution of a fabricated pattern can be obtained under the diffraction limit of a laser beam due to the nonlinear absorption phenomenon. In this paper, a top-down reverse building technique was introduced to fabricate a polymeric pattern on a metal layer. Also, a contour offset algorithm (COA) and a beam expanding method have been attempted to make precise patterns and to enlarge the working area. Through this work, several patterns for various applications on nano- and microtechnology were fabricated on a glass plate and a thin metal layer to demonstrate the usefulness of the developed algorithm. | - |
dc.language | English | - |
dc.publisher | WORLD SCIENTIFIC PUBL CO PTE LTD | - |
dc.subject | 2-PHOTON-ABSORPTION PHOTOPOLYMERIZATION | - |
dc.subject | IMPRINT LITHOGRAPHY | - |
dc.subject | FABRICATION | - |
dc.subject | MICROFABRICATION | - |
dc.subject | NANOFABRICATION | - |
dc.subject | MICROMACHINES | - |
dc.subject | RESOLUTION | - |
dc.subject | FEATURES | - |
dc.title | Direct nano-patterning methods using nonlinear absorption in photopolymerization induced by a femtosecond laser | - |
dc.type | Article | - |
dc.identifier.wosid | 000233999200005 | - |
dc.identifier.scopusid | 2-s2.0-27844538358 | - |
dc.type.rims | ART | - |
dc.citation.volume | 14 | - |
dc.citation.beginningpage | 331 | - |
dc.citation.endingpage | 340 | - |
dc.citation.publicationname | JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS | - |
dc.identifier.doi | 10.1142/S0218863505002773 | - |
dc.contributor.localauthor | Yang, Dong-Yol | - |
dc.contributor.localauthor | Kong, Hong-Jin | - |
dc.contributor.nonIdAuthor | Park, SH | - |
dc.contributor.nonIdAuthor | Lim, TW | - |
dc.contributor.nonIdAuthor | Yi, SW | - |
dc.contributor.nonIdAuthor | Lee, KS | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | nano-replication printing process | - |
dc.subject.keywordAuthor | two-photon polymerization | - |
dc.subject.keywordAuthor | femtosecond laser | - |
dc.subject.keywordAuthor | beam expansion technique | - |
dc.subject.keywordAuthor | contour offset algorithm | - |
dc.subject.keywordPlus | 2-PHOTON-ABSORPTION PHOTOPOLYMERIZATION | - |
dc.subject.keywordPlus | IMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | MICROFABRICATION | - |
dc.subject.keywordPlus | NANOFABRICATION | - |
dc.subject.keywordPlus | MICROMACHINES | - |
dc.subject.keywordPlus | RESOLUTION | - |
dc.subject.keywordPlus | FEATURES | - |
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