Influence of reaction with XeF2 on surface adhesion of Al and Al2O3 surfaces

Abstract

The change in surface adhesion after fluorination of Al and Al(2)O(3) surfaces using XeF(2) was investigated with atomic force microscopy. The chemical interaction between XeF(2) and Al and Al(2)O(3) surfaces was studied by in situ x-ray photoelectron spectroscopy. Fresh Al and Al(2)O(3) surfaces were obtained by etching top silicon layers of Si/Al and Si/Al(2)O(3) with XeF(2). The surface adhesion and chemical composition were measured after the exposure to air or annealing (at 200 degrees C under vacuum). The correlation between the adhesion force increase and presence of AlF(3) on the surface was revealed. (C) 2008 American Institute of Physics.