Depth dependence of ultraviolet curing of organosilicate low-k thin films

Abstract

UV radiation curing has emerged as a promising postdeposition curing treatment to strengthen organosilicate interlayer dielectric thin films. We provide the evidence of film depth dependent UV curing which has important effects on through thickness mechanical and fracture properties. Force modulation atomic force microscopy measurements of the elastic modulus through the thickness of the films revealed evidence of periodic modulations of the glass stiffness which increased in magnitude with UV curing time. Furthermore, while significant increases in fracture energy were observed with UV curing time at the top of the organosilicate film, much lower increases were observed at the bottom. The increase in fracture energy with UV curing was film thickness dependent. The cohesive fracture resistance was less sensitive to UV curing. Possible explanations for the stiffness modulations through the film thickness involving UV light interference or phase separation by spinodal decomposition during the cure process are described. (C) 2008 American Institute of Physics.